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Dr. Lars Hultman
Refereed Publications
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1. Single-crystal Ti2AlN thin films, Joelsson, T., Horling, A., Birch, J. and Hultman, L., App. Phys. Lett. 86, 111913 (2005). pdf
2. Epitaxial Ti2GeC, Ti3GeC2 and Ti4GeC3 MAX-phase thin films grown by magnetron sputtering, Hogberg, H., Eklund, P., Emmerlich, J., Birch, J. and Hultman, L., J. Mater. Res., 20[4], (2005). pdf
3. Growth of Ti₃SiC₂ thin films by elemental target magnetron sputtering, Emmerlich, J., Hoegberg, H., Sasvari, S., Persson, P. O. A., Hultman, L., Palmquist, J.-P., Jansson, U., Molina-Aldareguia, J. M. and Czigany, Z., Jour. App. Phys. 96[9], 4817-4826 (2004). pdf
4. Kink formation around indents in laminated Ti₃SiC₂ thin films studied in the nanoscale, Molina-Aldareguia, J. M., Emmerlich, J., Palmquist, J.-P., Jansson, U. and Hultman, L., Scripta Mater. 49, 155-160 (2003). pdf